LEO/ZEISS 1455VP

Electron Beam Lithography System

LEO /ZEISS 1455VP scanning electron microscope equipped with Raith Elphy Quantum for device fabrication.

Some of the key features of the Electron Beam Lithography System are:

• Accelerating voltages from 200 V to 30 kV
• Single writefield up to 1000 μm
• 250 nm feature resolution exposed using a 400 μm writefield
• PC-based pattern generator allow up to 63 different layers
• Allows fully automated or user assisted field to field alignment

Bookings and Trainings:

Internal Users: Please request access via PPMS https://ppms.eu/west-cambridge-campus/req/?pf=14&training=true&form=44

External Users: Please contact Dr. Peter Knight (pjkk1@cam.ac.uk) for training requests.

Equipment Location:

Room 4_014, Bay 4

Last Reviewed: 21st September 2021