LEO/ZEISS 1455VP
Electron Beam Lithography System
LEO /ZEISS 1455VP scanning electron microscope equipped with Raith Elphy Quantum for device fabrication.
Some of the key features of the Electron Beam Lithography System are:
- Accelerating voltages from 200 V to 30 kV
- Single writefield up to 1000 μm
- 250 nm feature resolution exposed using a 400 μm writefield
- PC-based pattern generator allow up to 63 different layers
- Allows fully automated or user assisted field to field alignment
Bookings and Trainings:
Internal Users: Please request access via PPMS https://ppms.eu/west-cambridge-campus/req/?pf=14&training=true&form=44
External Users: Please contact Dr. Peter Knight (pjkk1@cam.ac.uk) for training requests.
Equipment Location:
Room 4_014, Bay 4
Last Reviewed: 21st September 2021
@ChhowallaL
Group Drive